JPS61159366U - - Google Patents

Info

Publication number
JPS61159366U
JPS61159366U JP1985040741U JP4074185U JPS61159366U JP S61159366 U JPS61159366 U JP S61159366U JP 1985040741 U JP1985040741 U JP 1985040741U JP 4074185 U JP4074185 U JP 4074185U JP S61159366 U JPS61159366 U JP S61159366U
Authority
JP
Japan
Prior art keywords
thin film
mask
forming
workpiece
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1985040741U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0348204Y2 (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985040741U priority Critical patent/JPH0348204Y2/ja
Priority to US06/824,631 priority patent/US4704306A/en
Publication of JPS61159366U publication Critical patent/JPS61159366U/ja
Application granted granted Critical
Publication of JPH0348204Y2 publication Critical patent/JPH0348204Y2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
JP1985040741U 1985-03-20 1985-03-20 Expired JPH0348204Y2 (en])

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1985040741U JPH0348204Y2 (en]) 1985-03-20 1985-03-20
US06/824,631 US4704306A (en) 1985-03-20 1986-01-31 Method and mask for forming thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985040741U JPH0348204Y2 (en]) 1985-03-20 1985-03-20

Publications (2)

Publication Number Publication Date
JPS61159366U true JPS61159366U (en]) 1986-10-02
JPH0348204Y2 JPH0348204Y2 (en]) 1991-10-15

Family

ID=12589057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985040741U Expired JPH0348204Y2 (en]) 1985-03-20 1985-03-20

Country Status (2)

Country Link
US (1) US4704306A (en])
JP (1) JPH0348204Y2 (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000129419A (ja) * 1998-10-22 2000-05-09 Hokuriku Electric Ind Co Ltd 蒸着マスク
JP2007051342A (ja) * 2005-08-18 2007-03-01 Toyota Industries Corp フレーム
WO2014002841A1 (ja) * 2012-06-26 2014-01-03 シャープ株式会社 マスクフレーム

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5389397A (en) * 1989-08-29 1995-02-14 North American Philips Corporation Method for controlling the thickness distribution of a deposited layer
JP3446835B2 (ja) * 1991-03-27 2003-09-16 Ｈｏｙａ株式会社 ガラス光学素子用プレス成形型
US5264376A (en) * 1991-06-24 1993-11-23 Texas Instruments Incorporated Method of making a thin film solar cell
US5223108A (en) * 1991-12-30 1993-06-29 Materials Research Corporation Extended lifetime collimator
IL102120A (en) * 1992-06-05 1994-08-26 Persys Technology Ltd Mask, assembly and method that enable quality control of equipment for the production of semiconductor slice chips
US5415753A (en) * 1993-07-22 1995-05-16 Materials Research Corporation Stationary aperture plate for reactive sputter deposition
EP0682125A1 (en) * 1994-05-11 1995-11-15 Applied Materials, Inc. Controlling material sputtered from a target
US5527438A (en) * 1994-12-16 1996-06-18 Applied Materials, Inc. Cylindrical sputtering shield
US5750272A (en) * 1995-02-10 1998-05-12 The Research Foundation Of State University Of New York Active and adaptive damping devices for shock and noise suppression
US5669977A (en) * 1995-12-22 1997-09-23 Lam Research Corporation Shape memory alloy lift pins for semiconductor processing equipment
US5863396A (en) * 1996-10-25 1999-01-26 Applied Materials, Inc. Method and apparatus for fabricating a wafer spacing mask on a substrate support chuck
US6168832B1 (en) 1997-01-20 2001-01-02 Coherent, Inc. Three-dimensional masking method for control of coating thickness
GB9701114D0 (en) * 1997-01-20 1997-03-12 Coherent Optics Europ Ltd Three-dimensional masking method for control of optical coating thickness
US6030513A (en) * 1997-12-05 2000-02-29 Applied Materials, Inc. Full face mask for capacitance-voltage measurements
US6096404A (en) * 1997-12-05 2000-08-01 Applied Materials, Inc. Full face mask for capacitance-voltage measurements
JP2004055971A (ja) * 2002-07-23 2004-02-19 Pentax Corp 撮像素子
KR100868854B1 (ko) * 2002-08-29 2008-11-14 오리온오엘이디 주식회사 마스크 지지판
US7179335B2 (en) * 2002-10-28 2007-02-20 Finisar Corporation In situ adaptive masks
DK1630260T3 (da) * 2004-08-20 2011-10-31 Jds Uniphase Inc Magnetisk holdemekanisme til et dampudfældningssystem
KR102330330B1 (ko) * 2014-12-16 2021-11-25 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
CN104498871B (zh) * 2015-01-14 2017-04-12 京东方科技集团股份有限公司 一种掩膜装置及其组装方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5520739U (en]) * 1978-07-29 1980-02-09

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2003018A (en) * 1930-09-08 1935-05-28 Gen Plate Co Thermostat
US1987167A (en) * 1933-06-30 1935-01-08 Valverde Robert Bimetal thermostat element
US2675267A (en) * 1952-03-29 1954-04-13 Metals & Controls Corp Thermostatic element
US3170810A (en) * 1962-05-24 1965-02-23 Western Electric Co Methods of and apparatus for forming substances on preselected areas of substrates

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5520739U (en]) * 1978-07-29 1980-02-09

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000129419A (ja) * 1998-10-22 2000-05-09 Hokuriku Electric Ind Co Ltd 蒸着マスク
JP2007051342A (ja) * 2005-08-18 2007-03-01 Toyota Industries Corp フレーム
WO2014002841A1 (ja) * 2012-06-26 2014-01-03 シャープ株式会社 マスクフレーム

Also Published As

Publication number Publication date
US4704306A (en) 1987-11-03
JPH0348204Y2 (en]) 1991-10-15

Similar Documents

Publication Publication Date Title
JPS61159366U (en])
JPS6457688U (en])
JPS6383496U (en])
JPS599301Y2 (ja) つまみ
JPS6368627U (en])
JPS63123550U (en])
JPH0177933U (en])
JPH0198119U (en])
JPH0373401U (en])
JPH0356153U (en])
JPS63165859U (en])
JPS61196201U (en])
JPH0377814U (en])
JPS6322094U (en])
JPS63193834U (en])
JPS63186524U (en])
JPS60146416U (ja) 形状記憶合金製の指輪
JPS61109726U (en])
JPS61150852U (en])
JPS62103022U (en])
JPS6153928U (en])
JPH0345617U (en])
JPH0313759U (en])
JPH0197229U (en])
JPS6398587U (en])